Electroplating apparatus

ABSTRACT

Gas shielding is employed to prevent metal plating on contacts during electroplating to reduce particulate contamination and increase thickness uniformity. In another embodiment, gas shielding is employed to prevent deposition on the backside and edges of a semiconductor wafer during plating.

TECHNICAL FIELD

The present invention relates to a method and apparatus for electrolessplating and electroplating a metal on a substrate comprising a seedlayer. The present invention is applicable to plating copper or a copperalloy on a semiconductor substrate, particularly in forming integratedcircuits having submicron design features.

BACKGROUND ART

The escalating requirements for high density and performance associatedwith ultra large scale integration (ULSI) semiconductor wiring requireresponsive changes in interconnection technology, which is consideredone of the most demanding aspects of ultra large scale integrationtechnology. Such escalating requirements have been found difficult tosatisfy in terms of providing a low RC (resistance capacitance)interconnect pattern, particularly wherein submicron vias, contacts andtrenches have high aspect ratios due to miniaturization.

Conventional semiconductor devices comprise a semiconductor substrate,normally of monocrystalline silicon, and a plurality of sequentiallyformed dielectric interlayers and conductive patterns. An integratedcircuit is formed containing a plurality of conductive patternscomprising conductive lines separated by interwiring spacings, and aplurality of interconnect lines, such as bus lines, bit lines, wordlines and logic interconnect lines. Typically, the conductive patternson different layers, i.e., upper and lower layers, are electricallyconnected by a conductive plug filling a via opening, while a conductiveplug filling a contact opening establishes electrical contact with anactive region on a semiconductor substrate, such as a source/drainregion. Conductive lines formed in trench openings typically extendsubstantially horizontal with respect to the semiconductor substrate.Semiconductor "chips" comprising three and four levels of metallizationare becoming more prevalent as device geometries shrink to submicronlevels.

High performance microprocessor applications require rapid speed ofsemiconductor circuitry. The control speed of semiconductor circuitryvaries inversely with the resistance and capacitance of theinterconnection pattern. As integrated circuits become more complex andfeature sizes and spacings become smaller, the integrated circuit speedbecomes less dependent upon the transistor itself and more dependentupon the interconnection pattern. Thus, the interconnection patternlimits the speed of the integrated circuit.

In ULSI structures, high circuit speeds, high packing density and lowpowered dissipation are required. Consequently, feature sizes must bescaled down. The interconnect related time delays become the majorlimitation in achieving high circuit speeds. Shrinking device sizeautomatically miniaturizes the interconnect feature size which increasesinterconnect resistance and interconnect current densities. Poor stepcoverage of metal and submicron high aspect ratio via holes alsoincreases interconnect resistance and electromigration failures.

If the interconnection node is routed over a considerable distance,e.g., hundreds of microns or more, as in submicron technologies, theinterconnection capacitance limits the circuit node capacitance loadingand, hence, the circuit speed. As integration density increases andfeature size decreases in accordance with submicron design rules, therejection rate due to integrated circuit speed delays approaches andeven exceeds 20%.

One way to increase the control speed of semiconductor circuitry is toreduce the resistance of a conductive pattern. Conventionalmetallization patterns are typically formed by depositing a layer ofconductive material, notably aluminum (Al) or an alloy thereof, andetching, or by damascene techniques wherein trenches are formed indielectric layers and filled with a conductive material. Excessconductive material on the surface of the dielectric layer is thenremoved, as by chemical-mechanical polishing. Al is conventionallyemployed because it is relatively inexpensive, exhibits low resistivityand is relatively easy to etch. However, as the size of openings forvias/contacts and trenches is scaled down to the submicron range, stepcoverage problems have arisen involving the use of Al which hasdecreased the reliability of interconnections formed between differentwiring layers. Such poor step coverage results in high current densityand enhanced electromigration. Moreover, low dielectric constantpolyimide materials, when employed as dielectric interlayers, createmoisture/bias reliability problems when in contact with Al.

One approach to improved interconnection paths in vias comprises the useof completely filled plugs of a metal, such as W. Accordingly, manycurrent semiconductor devices utilizing VLSI (very large scaleintegration) technology employ Al for a wiring metal and W plugs forinterconnections at different levels. However, the use W is attendantwith several disadvantages. For example, most W processes are complexand expensive. Moreover, W has a high resistivity. The Joule heating mayenhance electromigration of adjacent Al wiring. Furthermore, W plugs aresusceptible to void formation and the interface with the wiring layerusually results in high contact resistance.

Another attempted solution for the Al plug interconnect problemcomprises the use of chemical vapor deposition (CVD) or physical vapordeposition (PVD) at elevated temperatures for Al deposition. The use ofCVD for depositing Al has proven expensive, while hot PVD Al depositionrequires very high process temperatures incompatible with manufacturingintegrated circuitry.

Copper (Cu) has recently received considerable attention as areplacement material for Al in VLSI interconnect metallizations. Cuexhibits superior electromigration properties and has a lowerresistivity than Al. In addition, Cu has improved electrical propertiesvisa-vis W, making Cu a desirable metal for use as a conductive plug aswell as conductive wiring. For comparable performance characteristics,aluminum interconnect lines typically exhibit a current density limit of2×10⁵ amp/cm² ; whereas, a copper line would typically exhibit a currentdensity limit of 5×10⁶ amp/cm². Cu electromigration in interconnectlines has a high activation energy, i.e., up to twice as large as thatof Al. Consequently, Cu lines that are significantly thinner than Allines can theoretically be employed, thereby reducing cross talk andcapacitance.

It is expected that a Cu interconnect material leads to an improvementof one and one half times in the maximum clock frequency of acomplimentary metal-oxide semiconductor (CMOS) chip vis-a-vis theAl-based interconnects for devices with effective channel ends of about0.25 μm. Such favorable electrical characteristics of Cu provide anincentive for developing Cu films as interconnect layers in ULSI devicesas well top metal layers. However, there are also disadvantagesattendant upon the use of Cu. For example, Cu metallization is verydifficult to etch. Moreover, Cu readily diffuses through silicondioxide, the typical dielectric interlayer material employed in themanufacture of semiconductor devices, and adversely affects the devices.

One conventional approach in attempting to form Cu plugs and wiringcomprises the use of damascene structures employing chemical mechanicalpolishing, as in Chow et al., U.S. Pat. No. 4,789,648. However, due toCu diffusion through dielectric interlayer materials, such as silicondioxide, Cu interconnect structures must be encapsulated by a diffusionbarrier layer. Typical diffusion barrier metals include tantalum (Ta),tantalum nitride (TaN), titanium nitride (TiN), titanium tungsten (TiW),and silicon nitride (Si₃ N₄) for encapsulating Cu. The use of suchbarrier materials to encapsulate Cu is not limited to the interfacebetween Cu and the dielectric interlayer, but includes interfaces withother metals as well.

Electroless deposition has been suggested as a technique for forminginterconnect structures. See, for example, "Electroless Cu for VLSI,"Cho et al., MRS Bulletin, June 1993, pp. 31-38; "Selective ElectrolessMetal Deposition For Integrated Circuit Fabrication," Ting et al., J.Electrochem. Soc., 136, 1989, p. 456 et seq.; "Selective ElectrolessMetal Deposition For Via Hole Filling in VLSI Multilevel InterconnectionStructures," Ting et al., J. Electrochem. Soc., 136, 1989, p. 462 etseq.; and Shacham et al., U.S. Pat. No. 5,240,497.

Electroless Cu deposition is attractive due to low processing costs andhigh quality Cu deposits. In addition, equipment for performingelectroless metal deposition is relatively inexpensive vis-a-vis othersemiconductor processing equipment for depositing metals. Electrolessdeposition also offers the advantageous opportunity for batch processingof wafers, thereby further reducing the cost of electroless depositionand increasing production throughput. However, electroless depositionrequires a catalytic surface, i.e., seed layer, for the autocatalyticaction to occur. See, for example, Baum et al., U.S. Pat. No. 4,574,095and "Electroless Copper Deposition on Metals and Silicides," Mak, MRSBulletin, August 1994, pp. 55-62. It is difficult to obtain reliable andreproducible electroless Cu deposition, since the seed layer surfacemust maintain catalytic activity for effective electroless deposition ofCu.

Copending application Ser. No. 08/587,264, filed Jan. 16, 1996,discloses a method of electrolessly depositing Cu in an interconnectstructure, which method comprises initially depositing a barrier layerin an opening, depositing a catalytic seed layer, preferably of Cu, onthe barrier layer, and then depositing a protective layer the catalyticlayer encapsulating and protecting the catalytic layer from oxidation.The preferred protective material is Al which forms an Al-Cu alloy atthe interface of the catalytic and protective layers, therebyencapsulating the underlying Cu. Subsequently, Cu is electrolesslydeposited from an electroless deposition solution which dissolves theoverlying protective alloy layer to expose the underlying catalytic Culayer.

As the aspect ratio of contact and via openings, as well as trenchopenings, approaches 2:1 and greater, it becomes increasingly morechallenging to voidlessly fill openings for contacts, vias and trenchesof interconnect patterns employing conventional technology, such asmagnetron sputtering techniques involving either direct current or radiofrequency sputtering. Conventional attempts to improve sputteringcapabilities comprise the use of a collimator as in Sandhu et al., U.S.Pat. No. 5,409,587.

A more recent approach in the evolution of high aspect ratio contact/viainterconnection technology involves the ionization of sputtered metalsby a high density plasma. See S. M. Rossnagel et al., "Metal iondeposition from ionized magnetron sputtering discharge," J. Vac. Sci.Technol. B 12(1), Jan/Feb 1994, pp. 449-453 and J. Hopwood et al.,"Mechanisms for highly ionized magnetron sputtering," J. Appl. Phys.,Vol. 78, No. 2, Jul. 15, 1995, pp. 758-765. Further attempts to improveRF induced plasma processing by generating a greater percent of ionizedsputtered material employing a coil having a generally flattened surfacedefined by parallel conductors is disclosed by Cuomo et al., U.S. Pat.No. 5,280,154.

Although electroless deposition and electroplating offer the prospect oflow cost, high throughput, high quality plated films and efficient via,contact and trench filling capabilities, the requirement for a catalyticseed layer becomes problematic, particularly in filling high aspectratio openings. Electroless plating generally involves the controlledautocatalytic deposition of a continuous film on the catalytic surfaceby the interaction in solution of a metal salt and a chemical reducingagent. Electroplating comprises the electrodeposition of an adherentmetallic coating on an electrode employing externally supplied electronsto reduce metal ions in the plating solution. A seed layer is requiredto catalyze electroless deposition or to carry electrical current forelectroplating. For electroplating, the seed layer must be continuous.However, for electroless plating, very thin catalytic layers, e.g., lessthan 100 Å, can be employed in the form of islets of catalytic metal.

Electroless plating has been applied to the manufacture of opticaldisks. See for example, Kumisaka et al., U.S. Pat. No. 4,894,260.

It is very difficult to form a high conductivity interconnect patternhaving high aspect ratio openings employing Cu or a Cu alloy, e.g., aCu-base alloy, by electroless plating or electroplating, becausesputtered catalytic seed layer materials particularly Cu, exhibitsextremely poor step coverage, particularly for high aspect ratioopenings, e.g., contact, via or trench openings of about 2:1 andgreater. Such poor step coverage would inhibit electroplating due todiscontinuities of the Cu seed layer, and inhibit electroless Cudeposition for failure of Cu to reach the bottom and lower side walls ofhigh aspect ratio vias/contacts or trenches. In addition, Cu has pooradhesion to dielectric materials and requires encapsulation to preventdiffusion.

A solution to such problems was addressed in copending application Ser.No. 08/857,129 filed May 15, 1997 wherein a method for electroplatingand electroless plating Cu is disclosed, comprising depositing a seedlayer containing a catalytically active metal, such as Cu, alloyed witha refractory metal, prior to electroless plating or electroplating. Incopending application Ser. No. 08/768,447 filed Dec. 18, 1996, anelectroless deposition technique is disclosed comprising the use of aspray process in lieu of liquid immersion, wherein itemized droplets ofan electroless plating solution are sprayed onto a substrate.

There are significant difficulties attendant upon the application ofelectroless plating and electroplating in the context of a semiconductorsubstrate, particularly for ULSI application. For example, duringelectroplating, metallic contact fingers are typically employed toprovide electrical contact with a seed layer on a substrate. During theelectroplating process itself, metal from the electroplating solution isdisadvantageously electroplated on the contact fingers, therebygenerating contaminating particles, as when the electroplated metal isdelaminated from the contact fingers. In addition, electroplated metalon the contact fingers increases contact resistance resulting in a highvoltage drop and failure.

A conventional approach to the problem of electroplating on contactfingers comprises frequent removal of electroplated metal from thecontact fingers, as by wiping or etching, to improve the reliability ofthe electrical contact. Such approaches are inefficient and timeconsuming.

Another problem frequently encountered in electroless plating orelectroplating a metal on a substrate is the undesirableelectrodeposition of metal on the backside and on the edges of thesubstrate. A satisfactory solution to that problem has not yet surfacedin the art.

A conventional wafer plating is disclosed in U.S. Pat. No. 5,429,733,which issued on Jul. 4, 1995 to Ishida. In the plating device disclosedby Ishida, the lower surface of the circumferential edge of the wafer isrestrained by a holding means onto a positioning base portion formed inan opening portion of a plating bath, and a plating fluid is appliedonto the lower surface of the wafer. An air bag is employed as a holdingmeans for downwardly depressing the wafer after plating. The air bagconstrains only the upper surface of the circumferential edge of thewafer at an expanded state and releases the constraint by contracting torestore an initial configuration in a non-expanded state. The backsideof the wafer and the edge of the wafer are not exposed to the platingsolution. However, the wafer is not rotated. As a result, the platingthickness uniformity is reduced and the loss of the plating solution isincreased since excess plating solution cannot be removed by waferspinning.

Another wafer plating device is disclosed in U.S. Pat. No. 5,472,592,issued on Dec. 5, 1995 to Lowery. The apparatus disclosed by Lowerycomprises a tank structure for containing an electrolyte and an anode. Ashaft is rotatably mounted within the tank to rotate about a first axis.An arm is mounted on the shaft, and a fixture for receiving thesubstrate is rotatably mounted on the arm to rotate about a second axis,so that the substrate is both revolved about the first axis and rotatedabout the second axis. The fixture wheel carries the substrate to beplated, such as a semiconductor wafer, which is mounted by three springloaded electrical contacts. Electrical contact is maintained between therotating substrate and a stationary power supply for plating. A flatannular gasket is received within an annular recess formed in the frontface of the fixture wheel to seal the back face of the wafer. A solidsheet gasket or another type of seal such as an O-ring seal, can also beused to seal the wafer backside. However, metal will be plated on theedge of the wafer as well as on the contact of the plating devicedescribed in U.S. Pat. No. 5,472,592.

Accordingly, there exist a need for an apparatus and efficientmethodology for preventing the undesirable electroplating of metal oncontact fingers in electrical contact with a seed layer on a substrateduring electroplating. There also exists a need for an apparatus andefficient methodology for preventing undesirable electrodeposition ofmetal on the backside and edges of a substrate during electrolessplating and electroplating on the front side of the substrate.

DISCLOSURE OF THE INVENTION

An object of the present invention is an apparatus for electroplating ametal on a substrate while substantially preventing electroplating metalon contact fingers.

Another object of the present invention is a method of electroplating ametal on a substrate while substantially preventing electroplating metalon contact fingers.

A further object of the present invention is an apparatus for platingmetal on the front side of a substrate while substantially preventingelectrodeposition of metal on the backside and edges of the substrate.

Another object of the present invention is a method of plating a metalon the front side of a substrate while substantially preventing metalfrom electrodeposition on the backside and edges of the substrate.

According to the present invention, the foregoing and other objects areachieved in part by an apparatus for electroplating a metal film on asubstrate comprising a backside, a front side, and a seed layerdeposited on the front side, which apparatus comprises: a processchamber for accommodating the substrate on which the metal film is to beelectroplated; a plurality of conductive contact fingers, each having afirst end for electrical contact with the seed layer on the substrate; ashell comprising an inner wall surrounding each contact finger, whichshell has a first end at about the first end of the contact finger,extending along a portion of the contact finger thereby forming a spacebetween the contact finger and the surrounding inner wall of the shell;a source of gas; and a supply line connected to the source of gas forsupplying gas into the space between the contact fingers and thesurrounding inner wall of the shell.

Another aspect of the present invention is a process for electroplatinga metal on a substrate comprising a backside and a front side with aseed layer deposited on the front side, which process comprises:establishing electrical contact between a first end of a contact fingerand the seed layer; substantially surrounding a portion of the contactfinger with a shell comprising an inner wall and a first end at aboutthe first end of a the contact finger extending along a portion of thecontact finger forming a space between the contact finger and thesurrounding inner wall of the shell; and flowing a gas into the spacebetween the contact finger and surrounding inner wall of the shell tosubstantially prevent electroplating on the contact finger.

A further aspect of the present invention is an apparatus for plating ametal on a front side of a substrate comprising a backside and edges,which apparatus comprises: a tank containing a plating solution; ahousing having a base wall and a circumferential sidewall extending fromthe base wall; at least one circumferentially disposed finger forretaining the substrate within the housing, such that the backside ofthe substrate is spaced apart from the upper base wall and the edges ofthe substrate are spaced apart from the extending circumferentialsidewall by a surrounding space; and a gas inlet through the base wallof the housing for flowing gas into the space surrounding the substrate.

Another aspect of the present invention is a process for depositing ametal on a seed layer deposited on a front side of a substrate havingedges and a backside, which process comprises: positioning the substratein a housing having a base wall with a gas inlet therein and acircumferential sidewall extending from the base wall, such that thebackside of the substrate is spaced apart from the base wall and theedges of the substrate are spaced apart from the circumferentialsidewall by a surrounding space; placing a plating solution into a tank;immersing the housing in the plating solution; flowing a gas through thegas inlet into the surrounding space; and plating a metal from thesolution onto the seed layer, whereby the flowing gas substantiallyprevents metal from plating onto the edges and backside of thesubstrate.

Additional objects and advantages of the present invention will becomereadily apparent to those skilled in this art from the followingdetailed description, wherein only the preferred embodiment of theinvention is shown and described, simply by way of illustration of thebest mode contemplated for carrying out the invention. As will berealized, the invention is capable of other and different embodiments,and its several details are capable of modifications in various obviousrespects, all without departing from the invention. Accordingly, thedrawings and description are to be regarded as illustrative in nature,and not as restrictive.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 schematically illustrates an electroplating apparatus inaccordance with an embodiment in the present invention.

FIG. 2 schematically illustrates a plating apparatus in accordance withanother embodiment of the present invention.

FIG. 3 schematically illustrates a plating apparatus in accordance withanother embodiment of the present invention.

BEST MODE FOR CARRYING OUT THE INVENTION

The present invention addresses and solves plating problems such asmetal plating in undesired and problematic areas. During conventionalelectroplating techniques, electrical contact is established with a seedlayer by means of contact fingers, typically metallic, which can haveany of various geometrical shapes and can comprise conventionalelectrical wiring. During electroplating, metal is undesirably plated onthe contact fingers, thereby increasing the contact resistance andcausing a high voltage drop leading to failure. In addition, whenelectrical contact is lost, the plating solution will actually removethe plated deposit. Delamination of such plating from the metal fingersalso results in undesirable particulate contamination of the platingsolution and a consequential decrease in thickness uniformity of theplated deposit.

According to the present invention such undesirable electroplating oncontact fingers is prevented or at least substantially reduced byproviding a shell, such as a dielectric shell, surrounding each contactfinger to form a space between the inner wall of the shell and outersurface of the contact finger. A gas, preferably under pressure andinert to the electroplating operation, such as air or nitrogen, isflowed in the space around the contact finger forming a flowing gasbarrier, thereby preventing metal from electroplating on the contactfinger and attendant disadvantages. The shell can be of any shape orform as, for example, cylindrical, and can comprise any of variousdielectric materials, such as a thermoplastic material. The shell canextend from a point approximate the point of contact between the contactfinger and the seed layer along a portion of the contact finger. Theshell can extend a sufficient distance out of the electroplatingsolution to facilitate connection to a gas source.

The substrate containing the seed layer is immersed in a tank containingan electroplating solution. The gas is flowed from a gas source througha line connected to the dielectric shell into the space between theinner wall of the dielectric shell and the contact finger. The gas flowsdownwardly and escapes from the end of the dielectric shell proximatethe contact finger terminal end on the seed layer in the form of bubblesthrough the plating solution into the atmosphere. The gas is flowedthrough the space between the inner walls of the dielectric shell andthe contact finger to create a flowing barrier at a sufficient rate toprevent electroplating metal on the contact finger. One having ordinaryskill in the art could easily optimize the gas flow rate in a particularsituation. For example, it has been found that a gas flow rate of about1 SCFM to 20 SCFM is generally effective. A valve for adjusting the gasflow rate can be provided at a convenient location between the gassource and inlet to the dielectric shell. A suitable rotating means,such as a conventional rotatable carrier, can be provided within thetank for rotating the substrate. The metal fingers can comprise anyelectrical conductive material to effect electrical contact with theseed layer and a suitable power input. Conventional platinized titaniumfingers have been found suitable for use in the present invention.

The present inventive technique can be advantageously applied toelectroplating Cu or a Cu alloy, such a Cu-base alloy, on asemiconductor substrate to form contact patterns as well asmetallization layers. An embodiment of the present invention isschematically illustrated in FIG. 1 and comprises a process chamber ortank 10 containing an electroplating solution 11. A substrate 12,comprising a seed layer 13 deposited on a front side thereof, isimmersed in the electroplating solution. For example, the substrate cancomprise a semiconductor substrate and the seed layer can comprise alayer suitable for electroplating Cu or a Cu-base alloy thereon. Such aseed layer can comprise a Cu-refractory metal alloy as disclosed incopending application Ser. No. 08/857,129 filed May 15, 1997.

With continued reference to FIG. 1, contact fingers 14 are provided witha first end in electrical contact with seed layer 13 and a second endsuitably connected to a current source to effect electroplating metal onseed layer 13. Shell 15 is provided about the circumference of eachcontact finger 14 extending from about the first end of the dielectricfinger 14 forming a circumferential space 16 between the inner wall ofshell 15 and contact finger 14. A source of gas 17, e.g., a pressurizedgas inert to electroplating, is connected to shell 15 by means of gasline 18. A valve 19 can be provided for adjusting the gas flow ratethrough circumferential space 16 between the inner wall of dielectricshell 15 and contact finger 14. The gas flow rate is adjusted to form aflowing gas barrier in the direction indicated by arrows whichsubstantially prevents metal from electroplating on contact finger 14.The gas flowing through circumferential space 16 passes downwardly andout of the bottom end of shield 15 approximate the point of contactfinger 14 with seed layer 13.

The embodiment depicted in FIG. 1, effectively prevents metal fromelectroplating on contact fingers 14, thereby avoiding particulatecontamination, and deplating which occurs upon failure of electricalcontact due to increased resistance and a voltage drop. The embodimentdepicted in FIG. 1 also avoids the need to frequently clean thedielectric fingers, thereby increasing production throughput.

In another embodiment in the present invention, undesirable plating ofmetal on the backside and edges of a substrate is substantiallyprevented by providing a flowing gas barrier. Conventional practices toavoid such undesirable backside and side edge metal plating comprisedthe use of an O-ring to isolate the backside and side edges; however,such an approach is not particularly effective. The flowing gas barriertechnique of the present invention is particularly effective inpreventing backside and edge metal plating in both electroplating andelectroless plating processes, preferably in electroless platingprocesses.

In accordance with such an embodiment, undesirable metal plating on thebackside and/or edges of a substrate is substantially prevented bypositioning the substrate in a housing comprising a base wall with a gasinlet therethrough and a circumferential sidewall extending downwardlyfrom the base wall. The substrate is positioned within the housing sothat a space is formed between the substrate and the housing. Thesubstrate, such as a semiconductor substrate having a seed layerthereon, is also positioned within the housing so that the seed layerfaces downwardly. The substrate can be retained within the housing byone or more circumferential fingers, e.g., dielectric fingers.

The housing, with the substrate positioned therein, is immersed in atank containing a plating solution. A gas, for example, a gas inert withrespect to the plating process, such as air or nitrogen, is flowed intothe housing, as through a gas line connected to the gas inlet throughthe base wall of the housing. The gas is flowed through the spacebetween the housing and the substrate primarily on the backside and sideedges of the substrate, at a gas flow rate sufficient to substantiallyprevent metal from plating on the backside and side edges. A valve canbe provided to adjust the gas flow rate. One having ordinary skill inthe art could easily optimize the gas flow rate in a particularsituation to substantially prevent metal plating on the backside and/oredges of the substrate. For example, it has been found that a gas flowrate of about 1 SCFM to about 20 SCFM is generally effective.

The retaining fingers can comprise any dielectric material, such as athermoplastic material. In addition, rotating means, such as aconventional rotating carrier, can be provided to rotate the substrateand/or housing during plating.

An embodiment for substantially preventing metal plating on the backsideand edges of a substrate is schematically illustrated in FIG. 2 andcomprises a tank 20 in which housing 21 is immersed. Housing 21comprises an upper base wall 21A, having a gas inlet 21C therethrough,and circumferential sidewall 21B extending downwardly from upper basewall 21A. A substrate 22 is retained within housing 21 such that seedlayer 22A on the front side of substrate 22 faces downwardly. Substrate22 is shown retained within housing 21 by circumferentially disposeddielectric fingers 23, such that a surrounding space 24 is formedbetween the upper side of substrate 22 and upper base wall 21A andbetween the edges of substrate 22 and circumferential downwardlyextending sidewall 21B.

Gas line 25 is connected at one end to gas inlet 21C by gas coupling 26and to pressurized gas source 27 at the other end. A valve 28 isprovided to control the gas flow rate through gas inlet 21C into space24. Tank 20 is filled with a plating solution 29 for electroplating orelectroless plating. Conventional rotating means, such as a rotatingcarrier (not shown), for rotating the substrate or housing can beoptionally provided to enhance plating uniformity, consistent withconventional practices.

In another embodiment of the present invention, a substrate is retainedwithin a housing such that the seed layer faces upwardly within ahousing which also opens upwardly within a tank, thereby substantiallypreventing metal plating on the backside and edges of the substrate aswell as on contact fingers. Adverting to FIG. 3, housing 35 is formedintegrally with cylindrical support 35A for rotation, as indicated byarrow A, powered by a conventional motor (not shown). Substrate 22 ispositioned within housing 35, with seed layer 22A facing upwardly, andis retained within housing by fingers 36. Surrounding gas space 34substantially prevents metal plating on the backside and edges of wafer22. Shell 15A is provided around the contact finger 14A forming a space16A between the inner wall of shell 15A and contact finger 14A. Gasflowing in space 16A between the inner wall of shell 15A and contactfinger 14A provide protection of contact finger to electroplating. Noplating on contact fingers 14A was observed. Nonrotating cylinder 31 isconnected to cylinder 35A by means of a conventional electrical coupling37, such as a nickel-cadmium coupling available from Senitool, Inc., ofKalispell, Mont. Cylinder 31 is provided to accommodate electricalwiring 32A, 32B and to support gas line 25. Internal passages 35Baccommodate electrical wiring 32A and 32B and provide a path for gasflow. Elements similar to those in FIG. 1 and FIG. 2 bear similarreference numerals.

The electroplating and electroless plating solutions employed inpracticing the various embodiments of the present invention areconventional, including Cu or Cu-base alloy plating solutions and,hence, not described herein in detail. The embodiments of the presentinvention can be practiced in conventional tanks or apparatus forelectroplating and electroless plating, such as the electroplatingprocessing chamber commercially marketed by Semitool of Kalispell, Mont.

The present invention enjoys general applicability in plating any of thevarious metals on any various types of substrate, but is particularapplicable to plating Cu and Cu-alloys during manufacturingsemiconductor devices employing a semiconductor substrate, particularlyfor ULSI devices and interconnect patterns and metallization layers withhigh reliability.

In the previous descriptions, numerous specific details are set forth,such as specific materials, structures, chemicals, processes, etc., inorder to provide a thorough understanding of the present invention.However, as one having ordinary skill in the art would recognize, thepresent invention can be practiced without resorting to the detailsspecifically set forth. In other instances, well known processingstructures have not been described in detail in order not tounnecessarily obscure the present invention.

Only the preferred embodiment of the invention and but a few examples ofits versatility are shown and described in the present disclosure. It isto be understood that the invention is capable of use in various othercombinations and environments and is capable of changes or modificationswithin the scope of the inventive concept as expressed herein.

What is claimed is:
 1. An apparatus for electroplating a metal film on asubstrate comprising a backside, a front side, and a seed layerdeposited on the front side, which apparatus comprises:a process chamberfor accommodating the substrate on which the metal film is to beelectroplated; a plurality of conductive contact fingers, each having afirst end for electrical contact with the seed layer on the substrate; ashell comprising an inner wall surrounding each contact finger, whichshell has a first end at about the first end of the contact fingerextending along a portion of the contact finger, thereby forming a spacebetween the contact finger and the surrounding inner wall of the shell;a source of gas; and a supply line connected to the source of gas forsupplying gas into the space between the contact finger and thesurrounding inner wall of the shell.
 2. The apparatus according to claim1, wherein each contact finger comprises platinized titanium.
 3. Theapparatus according to claim 1, wherein the shell comprises a dielectricmaterial.
 4. The apparatus according to claim 3, wherein the dielectricmaterial comprises a thermoplastic material.
 5. The apparatus accordingto claim 1, wherein, the process chamber is adapted to hold anelectroplating solution, the apparatus comprising:a pressurized sourceof gas for flowing gas around the contact finger in the space betweenthe contact finger and surrounding inner wall of the shell tosubstantially prevent electroplating on the contact finger.
 6. Theapparatus according to claim 5, further comprising a valve forcontrolling the flow rate of the gas.
 7. The apparatus according toclaim 5, wherein the process chamber is adapted to hold anelectroplating solution comprising components for electroplating copperor a copper-base alloy on a semiconductor substrate.
 8. The apparatusaccording to claim 1, further comprising a rotatable carrier in theprocess chamber for rotating the substrate.
 9. An apparatus for platinga metal on a front side of a substrate comprising a backside and edges,which apparatus comprises:a tank adapted to hold a plating solution; ahousing having a base wall and a circumferential sidewall extending fromthe base wall; at least one circumferentially disposed finger forretaining the substrate within the housing, such that the backside ofthe substrate is spaced apart from the base wall and the edges of thesubstrate are spaced apart from the extending circumferential sidewallby a surrounding space; and a gas inlet through the base wall of thehousing for flowing gas into the space surrounding the substrate. 10.The apparatus according to claim 9, wherein the circumferential sidewallextends downwardly from the base wall.
 11. The apparatus according toclaim 9, further comprising:a source of gas; and a gas line connectingthe source of gas to the gas inlet.
 12. The apparatus according to claim11, comprising a pressurized source of gas and a valve for regulatingthe flow rate of the pressurized gas.
 13. The apparatus according toclaim 12, further comprising a rotatable carrier in the tank forrotating the substrate.
 14. The apparatus according to claim 9, whereinthe circumferential sidewall extends upwardly from the base wall. 15.The apparatus according to claim 14, wherein the housing comprises anintegral rotatable cylinder extending out of the tank.